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JIURI NEW MATERIALS

TIMELINE

Chronology of Major Events


30

2021

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12

2021 Company Milestones


In 2021, Jiuri Semiconductor was established.

The National Intellectual Property Administration has granted our company patent rights for the invention entitled “A Polymerizable Type II Photoinitiator and Its Preparation Method.”

Huaihua Jiuyuan New Materials Co., Ltd. has been established.
The National Intellectual Property Administration has granted our company patent rights for the invention entitled “A Method for Preparing a Benzophenone‑Type Compound” and for “A White Wood Finish Cured by UV‑LED Light and Its Preparation Method.”
The National Intellectual Property Administration has granted our company patent rights for the invention entitled “A UV–Moisture Dual-Curing Coating for Eyeglass Frames and Its Preparation Method.”

The National Intellectual Property Administration has granted our company patent rights for the invention entitled “A Method for Preparing an α-Hydroxyketone Photoinitiator.”
The National Intellectual Property Administration has granted our company patent rights for the inventions “A Method for Preparing Methyl-Substituted Benzaldehyde” and “A Method for Preparing Acryloylmorpholine.”
Shandong Jiuxing Zhihe New Materials Technology Co., Ltd. has been established.

The National Intellectual Property Administration has granted our company patent rights for the invention entitled “Preparation and Application of a Self-Hydrogen-Generating Macromolecular Benzophenone.”
Jiu Ri New Materials’ wholly owned subsidiary, Dajing Information Chemicals (Xuzhou) Co., Ltd., has signed merger and acquisition agreements with Jinghong Biochemical (Xuzhou) Co., Ltd. and Keli Biotechnology (Xuzhou) Co., Ltd.

Jiu Ri New Materials donated RMB 800,000 to the Zhangjiajie Charity Association to support epidemic prevention and control efforts in Zhangjiajie.
Tianjin Jiuri Semiconductor Materials Co., Ltd. was established.
The National Intellectual Property Administration has granted our company patent rights for the utility model entitled “A Drying Device for a Photoinitiator.”

The company has been granted an invention patent entitled “A Method for Preparing Phenyl Bis(2,4,6‑trimethylbenzoyl)phosphine Oxide.”
Jiu Ri New Materials has been awarded the “Science and Technology Innovation Golden Steed Award for Outstanding Company.”
The 22nd Annual Conference on Radiation Curing of the Radiation Curing Professional Committee of the Chinese Society of Photographic Science and Technology, hosted by Tianjin Jiuri New Materials Co., Ltd., was solemnly inaugurated in Tianjin.
The National Intellectual Property Administration has granted our company a utility model patent for “A Waste Liquid Treatment Device in a TPO Production Process.”

The National Intellectual Property Administration has granted our company a utility model patent entitled “A Purification Device for a Photoinitiator.”
The National Intellectual Property Administration has granted our company a utility model patent entitled “A Reactor for the Synthesis of Photoinitiators.”
The third citywide ceremony marking the completion of major projects, along with the groundbreaking for key projects in Hongjiang District and the foundation-laying ceremony for the Huaihua Jiuyuan Project, was held at the Huaihua Jiuyuan construction site.
To support the development of the chemistry program at Nankai University, the company has donated RMB 30 million to establish the “Jiuri New Materials–Nankai University Chemistry Development Fund.”
The company has established a strategic partnership with Nankai University and founded the “Nankai University–Jiuri New Materials Joint Research Institute.”

The National Intellectual Property Administration has granted our company patent rights for the invention entitled “A Cyclic Process for Producing Photoinitiators 1173 and 184” and “A Method for Preparing Polysilazane Materials and Their Applications.”
The company’s wholly owned subsidiary, Hunan Jiuri New Materials Co., Ltd., has acquired and gained controlling interest in Hunan Hongrun Chemical Technology Co., Ltd.
The National Intellectual Property Administration has granted our company a utility model patent entitled “A Device for the Absorption and Recycling of Exhaust Gases in the Synthesis of DETX.”
The National Intellectual Property Administration has granted our company seven utility model patents, including “An Automated Control System for the Continuous Production of Photoinitiators,” “A Device for Reducing Metal Ions in Photoinitiators,” “A Purification and Crystallization Reactor for Preparing Photoinitiators,” “An Adsorption Device Used in the Preparation Process of Photoinitiators,” “A Combined Reactor for Photoinitiator Synthesis,” “An Efficient Solvent Removal Device for Photoinitiators,” and “A Wastewater Treatment Device for Photoinitiator Processing.”