Jiuri New Materials Makes Its Debut at the 2025 Shiyin Lithography Photoresist Industry Conference | Breakthroughs in Domestic Photoresist Technology and New Opportunities for Industrial Collaboration

　　On July 9–10, 2025, the 2025 Shiyin Lithography Industry Conference was grandly held in Hefei. As the most influential industry event in China’s photoresist sector, the conference brought together leading companies, research institutions, academic experts, and upstream and downstream enterprises to jointly discuss the latest advancements, challenges, and solutions in advanced lithography technologies, photoresist materials, and equipment. As a key domestic player in the photoresist and its critical raw material sectors, Jiuri New Materials was invited to attend, deliver a keynote address, and showcase the company’s core technological breakthroughs and production capacity deployments in photoresists, photosensitizers, and other supporting materials.

　　This conference will cover the latest research advances and application prospects of cutting-edge lithography technologies, including extreme ultraviolet (EUV) lithography, electron-beam lithography, and nanoimprint lithography. At the same time, it will provide an in-depth analysis of the current status and technical bottlenecks in the domestic production of lithographic materials—such as photoresists, wet electronic chemicals, and photomasks—and explore how technological innovation and industrial upgrading can enhance the self-sufficiency and quality of China’s lithography materials.

　　On the morning of July 10, at the special forum on photoresist raw materials and key equipment, Tang Hongying, head of the Semiconductor Chemical Materials Division at Jiuri New Materials, delivered a keynote speech titled “Domestication of Photoresists—Jiuri Pioneering Ahead.”

　　Tang Hongying stated that, at present, the Jiu Ri semiconductor chemical materials industry development platform has been essentially fully established. With both display‑related and semiconductor photoresists—and their core raw materials—pursuing parallel development, the company has built an integrated, end‑to‑end industrial chain spanning from upstream raw materials such as photosensitizers/photo‑initiators, monomers, and auxiliary reagents to downstream photoresist product lines.

　　The Dajing Information project to produce 600 tons per year of photo‑sensitizers specifically for microelectronic lithography is now in mass production and has secured continuous orders at the ton‑level. Meanwhile, Dajing New Materials’ 4,500‑ton lithography‑resist project has been completed and has entered the production phase, with an annual capacity of 4,000 tons of panel‑grade lithography resist and 500 tons of semiconductor‑grade lithography resist, primarily manufacturing g‑, h‑, and i‑line resists for semiconductors as well as panel‑grade resists. In addition, Jiuri New Materials has established production capabilities of 360 tons per year for electronic chemicals—including electronic‑grade gallic acid, electronic‑grade propyl gallate, electronic‑grade photo‑sensitizers OXE‑01 and OXE‑02, electronic‑grade TPPA, and electronic‑grade THPE—alongside 225 tons per year of HBP and 452 tons per year of NAC. Through its efforts in the semiconductor sector, Jiuri New Materials has filled critical gaps in core raw materials for mature semiconductor processes and display‑panel applications, providing robust support to accelerate the localization of materials used in displays and semiconductors.

At this conference, Jiuri New Materials demonstrated its unwavering commitment to achieving domestic self-sufficiency in semiconductor materials. Leveraging its strengths in independent R&D, quality control, production capacity assurance, and customer collaboration, the company has injected significant momentum into China’s photolithography resist industry chain. Looking ahead, the company will continue to ramp up R&D investment, strengthen its core proprietary intellectual property, and proactively explore new frontiers within the photolithography sector. Jiuri New Materials looks forward to working closely with all players across the industry chain to deepen “industry–university–research–application” collaboration, break through more critical technological bottlenecks, and strive to become a pivotal link in the wave of domestic photolithography resist development.